The "bubble-take" type of graphene is to etch the copper-based graphene in an etching solution, and rinse it with deionized water to remove the graphene on the back, and only one side has graphene. Therefore, during the etching process, the graphene on the upper surface needs to be protected by PMMA. This kind of graphene is very convenient to use. Since it has been cleaned, the graphene obtained by this method is very clean. Users can "bubble" the copper substrate in the etching solution and "take out" the graphene. Then it is very convenient to transfer the graphene to the target substrate according to your own needs.

Why only "bubble-take" graphene has PMMA on the surface of graphene?
This is due to the characteristics of the product itself. The "bubble-take" type of graphene is to etch the copper-based graphene in an etching solution, and rinse it with deionized water to remove the graphene on the back, and only one side has graphene. Therefore, during the etching process, the graphene on the upper surface needs to be protected by PMMA.